É豸Ãû³Æ Equipment Name

HJT°åʽµÈÀë×ÓÌåÔöÇ¿»¯Ñ§ÆøÏà³Á»ýÉ豸  HJT In-line PECVD

É豸ÐͺŠEquipment Model

PD-1022/UD

É豸ÓÃ; Equipment Application

ÖƱ¸±¾Õ÷¼°²ôÔӷǾ§¹è±¡Ä¤¡£

Intrinsic film deposition & a-si film doping.

É豸¹¤ÒÕ  Processes

¹¤ÒÕÆøÌåÔÚÉäƵRFµç´Å³¡Çé¿öÖеçÀëÏ໥·´Ó¦£¬Ôڳĵ×ÉϳÁ»ý³öÏàÓ¦µÄ±¡Ä¤ÖÊÁÏ¡£

Ionized precursor gases deposit thin films on a substrate.

¼¼ÊõÌص㠠Features

1¡¢½ÏС·´É书ÂʵĿìËÙÆô»Ô¡¢¾ùÔÈÎȶ¨´óÃæ»ý³ÉĤ¡£

Quick RF ignition with least reflect power for uniform and stable film deposition.

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Matured and stable multi-feed in RF technology compatible for even large process chamber.

3¡¢Ç»ÌåÄÚ·´Ó¦¼ä¾à¿Éµ÷¡¢Áé»îµÄ¹¤ÒÕ´°¿Ú¡£

Continuous adjustable gas between diffuser and substrate providing flexible process possibilities.

4¡¢´ó²úÄܵͱ¾Ç®¡¢¶¨ÖÆÉ豸½á¹¹¡£

High throughput with relative low cost, with capability of customized product design.

5¡¢Ä
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Modularized design for easy installation and maintenance, together with highest safety protocol from design to fabrication.

É豸²ÎÊý  Parameters