管式LPCVD设备
管式LPCVD设备
设备名称 Equipment Name
管式LPCVD设备 Horizontal LPCVD
设备型号 Equipment Model
LD-420/LD-420L/LD-420MAX
设备用途 Equipment Application
TOPCon电池隧穿氧化层、i-poly、D-poly低压化学气相沉积 。
Deposition of tunnel oxide layer, i-Poly and D-poly for TOPCon solar cells.
技术特点 Features
1、低压与热壁工艺特性，成膜均匀性、致密性好 。
Low pressure and hot wall process characteristics, with better film uniformity and good compactness.
2、LPCVD工艺特性，基片密排对成膜速率影响� 。ス茏捌看� 。
LPCVD process, densely loaded substrates have little effect on the coating rate, with large loading capacity in single tube.
3、更多温区设置，可靠包管片间均匀性 。
More temperature zones to ensure the uniformity between wafers reliably.
4、独立调理分段进气，弥补气流耗尽效应 。
Independently adjustable segmented air inlet to compensate for the airflow depletion effect.
设备参数 Parameters
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