设备名称 Equipment Name

管式A&P设备  Horizontal PEALD (A&P)

设备型号 Equipment Model

PD-520L/PD-520MAX

设备用途 Equipment Application

AlO+SiN薄膜沉积。
AlO+SiN Thin-film Deposition.

技术特点  Features

1、原子层沉积工艺特性
，成膜均匀性好。

Atomic layer deposition process, with better film uniformity.

2、同机台或同管完成多层膜沉积
，减少工艺环节
，有效提升良率、降低碎片率。
Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.

3、自主研发液态源前驱体蒸气输送与前驱体快速切换技术。
Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.

4、适应差别前驱体、差别质料钝化层沉积
，工艺拓展空间大。
Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.

设备参数  Parameters